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IC fabrication technology is at the core of the subject of VLSI. For, practical implementation of the design and principles of VLSI is possible only through an in depth understanding of the fabrication processes and procedures. In order that young undergraduate students be initiated into this extremely dynamic yet, complex world of fabrication, IC Fabrication Technology has been written in a highly illustrative manner that allows comprehensive visualization. The book provides an introduction to the major fabrication process steps for silicon based CMOS technology and provides necessary literature that can help generate experiments. Thus, the undergraduate students pursuing a course on IC fabrication will find this book necessary and postgraduate students pursuing the discipline of VLSI will find this book handy.
Books features
Detailing - All important and critical steps to silicon IC fabrication have been detailed with clarity on material, temperature, etc considerations.
True to life Scenarios - Vivid descriptions to problems encountered in laboratories have been presented with practical solutions.
ULSI Technology - Current research, especially those that are aimed at providing a solution to the ever increasing cry for higher speed, lower power and maximum number of functional ICs on a chip, are discussed briefly in the chapter on ULSI (nano) Fabrication.
Table of Contents:
Overview of Metal Oxide Semiconductor (MOS) Transistor
Silicon Wafer Preparation for MOS Transistor Fabrication
MOS Transistor Process Flow
Oxidation
Mask
Lithography
Etching
Diffusion
Ion-Implantation
Thin Film Deposition
ULSI (nano) FabricationISBN - 9781259029585
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